Browsing Faculty of Mathematics and Natural Sciences by Journals "Physical Review Applied"
Now showing items 1-1 of 1
-
Nanometer-Resolution Mask Lithography with Matter Waves: Near-Field Binary Holography
(Peer reviewed; Journal article, 2019)Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of 13.5 nm are currently under development. In principle, ...