• Nanometer-Resolution Mask Lithography with Matter Waves: Near-Field Binary Holography 

      Nesse, Torstein; Simonsen, Ingve; Holst, Bodil (Peer reviewed; Journal article, 2019)
      Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of 13.5 nm are currently under development. In principle, ...
    • Observation of the boson peak in a two-dimensional material 

      Tømterud, Martin; Eder, Sabrina Daniela; Büchner, Christin; Wondraczek, Lothar; Simonsen, Ingve; Schirmacher, Walter; Manson, Joseph R.; Holst, Bodil (Journal article; Peer reviewed, 2023)
      The boson peak is an excess in the phonon vibrational density of states relative to the Debye model. It has been observed in a wide range of amorphous materials, from inorganic glasses to polymers. Two-dimensional random ...