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dc.contributor.authorBuckley, Noah
dc.contributor.authorMarquardt, Kyle Lohse
dc.contributor.authorReuter, Ora John
dc.contributor.authorTertytchnaya, Katerina
dc.date.accessioned2024-07-04T08:08:26Z
dc.date.available2024-07-04T08:08:26Z
dc.date.created2023-07-17T13:38:41Z
dc.date.issued2024
dc.identifier.issn0003-0554
dc.identifier.urihttps://hdl.handle.net/11250/3137967
dc.description.abstractBeing popular makes it easier for dictators to govern. A growing body of scholarship therefore focuses on the factors that influence authoritarian popularity. However, it is possible that the perception of popularity itself affects incumbent approval in autocracies. We use framing experiments embedded in four surveys in Russia to examine this phenomenon. These experiments reveal that manipulating information—and thereby perceptions—about Russian President Vladimir Putin’s popularity can significantly affect respondents’ support for him. Additional analyses, which rely on a novel combination of framing and list experiments, indicate that these changes in support are not due to preference falsification, but are in fact genuine. This study has implications for research on support for authoritarian leaders and defection cascades in nondemocratic regimes.en_US
dc.language.isoengen_US
dc.publisherCambridge University Pressen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleEndogenous Popularity: How Perceptions of Support Affect the Popularity of Authoritarian Regimesen_US
dc.typeJournal articleen_US
dc.typePeer revieweden_US
dc.description.versionpublishedVersionen_US
dc.rights.holderCopyright 2023 the authorsen_US
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode2
dc.identifier.doi10.1017/S0003055423000618
dc.identifier.cristin2162544
dc.source.journalAmerican Political Science Reviewen_US
dc.source.pagenumber1046-1052en_US
dc.identifier.citationAmerican Political Science Review. 2024, 118 (2), 1046-1052.en_US
dc.source.volume118en_US
dc.source.issue2en_US


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